A recent paper on area selective deposition, written by our own Fatemeh Hashemi, was featured recently in ACS Nano.

The paper, which discusses how a mild etchant can be used to improve the selectivity of ALD deposited on patterned SAMs, was recently accepted by ACS Nano. The journal requested that Fatemeh create a video highlighting her work, and a prospective article was written for it. You can see the video below, or on Youtube.

Congratulations, Fatemeh! Way to represent the Bent Group!