Fatemeh Successfully Defends Thesis
Good luck in your new lab in Delft University
Congratuations to Fatemeh on successfully defending her thesis, which focused on area-selective atomic layer deposition. During her time in the Bent lab, she helped to develop many new processes, including new methods for improving deposition selectivity using self-assembled monolayers and selective etchants. For this work, she was highly recognized, including her work being featured in ACS Nano and Business Wire. Moving forward, Fatemeh has accepted a post-doctoral position at Delft University in the Netherlands. We're wishing you all the best in your life and future endeavors!