The AVS ALD 2018 Conference took place in Incheon, South Korea.

The American Vacuum Society (AVS) 2018 conference in atomic layer deposition took place this year in Incheon, South Korea, just outside of Seoul. Dara and Joel both attended and presented at the conference; Dara's talk was titled "Toward Area Selective ALD on Metal/SiO2 Substrates Using SAMs: Comparison of Cu, Co, W, and Ru", and Joel's was titled "Elucidation fo the Mechanisms of Nickel (II) and Iron (III) Oxide Films Grown with Ozone by Atomic Layer Deposition". Many Bent Group alumni currently hold faculty or industry positions in the field of ALD around the world, so many previous students and postdocs were in attendance as well. The wide-ranging impact of the group on the field is clear!