Group's Area-Selective ALD Work Featured on Cover of C&EN
Congratulations, Stacey, Dara, and Tzu-Ling!
Stacey, Dara, and Tzu-Ling were featured on the cover of Chemical & Engineering News! The feature is a part of their story on recent promising developments in area-selective atomic layer deposition and microelectronics fabrications. The story and cover image can be found on their website, here.