The Technical Excellence Award is an incentive and recognition program for research of exceptional value to SRC members. Congratulations, Stacey!!!

The 2020 honor was presented to Stacey for seminal contributions in area selective deposition and semiconductor patterning technologies that have accelerated sub-10nm scaling. Her accomplishments include her pioneering work in atomic layer deposition (ALD), including the use of self-assembled monolayers for ALD.Her research and leadership has opened up the new paradigm of area selective deposition (ASD) for controlled bottoms-up assembly. She has fostered and educated the best experts in the field of materials surface chemistry and its application to electronics. Listen to her acceptance speech here.